|
关注：1
2013-05-23 12:21
求翻译：Fig. 2 shows the AFM image of the Si face before water vapor plasma irradiation. It was found that even though the surface was processed by CMP, the stepterrace structure was very disordered. After plasma irradiation, this surface became very rough due to the volumetric expansion in the oxidation process. Although thes是什么意思？ 待解决
 悬赏分：1
- 离问题结束还有
Fig. 2 shows the AFM image of the Si face before water vapor plasma irradiation. It was found that even though the surface was processed by CMP, the stepterrace structure was very disordered. After plasma irradiation, this surface became very rough due to the volumetric expansion in the oxidation process. Although thes
问题补充： |
|
2013-05-23 12:21:38
图。
|
|
2013-05-23 12:23:18
正在翻译，请等待...
|
|
2013-05-23 12:24:58
。 2个展示Si面孔的AFM图象在水蒸气血浆辐照区域之前。 它被发现，即使表面由CMP处理， stepterrace结构是非常混乱的。 在血浆辐照区域以后，这表面在氧化作用过程中成为了非常粗砺由于容量扩展。 虽然这些表面是非常粗砺的，在大块SiC起因于脱臼的坑未被发现。 干燥热量氧化作用在SiCSi面孔也被举办了。
|
|
2013-05-23 12:26:38
图 2 显示寺脸前水蒸气等离子体辐照的原子力显微镜图像。它被发现即使表面由 CMP 处理，stepterrace 结构是非常混乱。等离子体辐照后这种表面变得非常粗糙由于氧化过程中的体积膨胀。虽然这些表面很粗糙，坑造成的位错的散装碳化硅均未发现。干热氧化也进行碳化硅-硅脸上的表情。
|
|
2013-05-23 12:28:18
正在翻译，请等待...
|
湖北省互联网违法和不良信息举报平台 | 网上有害信息举报专区 | 电信诈骗举报专区 | 涉历史虚无主义有害信息举报专区 | 涉企侵权举报专区
