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关注：1
2013-05-23 12:21
求翻译：一般在沈積氮化鋁薄膜的方式有：直流或交流磁控濺鍍法(DC,RF magnetron sputtering) [15-20]，化學氣相沈積法(chemical vapor deposition, CVD)[21,22]、分子束磊晶成長(molecular beam epitaxy, MBE)[23]等是什么意思？ 待解决
 悬赏分：1
- 离问题结束还有
一般在沈積氮化鋁薄膜的方式有：直流或交流磁控濺鍍法(DC,RF magnetron sputtering) [15-20]，化學氣相沈積法(chemical vapor deposition, CVD)[21,22]、分子束磊晶成長(molecular beam epitaxy, MBE)[23]等
问题补充： |
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2013-05-23 12:21:38
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2013-05-23 12:23:18
General on deposits 氮化 aluminum mylar to: DC or AC disk control onto a method (DC,RF magnetron sputtering) [15-20], chemical gas deposits method (chemical vapor deposition, CVD)[21,22], a bundle with integrity and express ourselves with authenticity chip growth (molecular beam epitaxy, MBE)[23], etc
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2013-05-23 12:24:58
正在翻译，请等待...
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2013-05-23 12:26:38
Deposition of aluminum nitride thin films by: AC or DC magnetron sputtering (DC,RF magnetron sputtering) [15-20], chemical vapor Shen Jifa (chemical vapor deposition, CVD) [21,22], molecular beam epitaxial growth (molecular beam epitaxy, MBE) [23]
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2013-05-23 12:28:18
正在翻译，请等待...
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