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关注：1
2013-05-23 12:21
求翻译：The workpiece is carefully cleaned of the entire dirt and oxides. Then it is coated with a light activated, etchant resistant material ca11edphotoresist and baked dry. After this the workpiece is exposed to a strong ultra-violet light to expose the photo-resist. After the exposure the photo-resist is developed to remov是什么意思？ 待解决
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- 离问题结束还有
The workpiece is carefully cleaned of the entire dirt and oxides. Then it is coated with a light activated, etchant resistant material ca11edphotoresist and baked dry. After this the workpiece is exposed to a strong ultra-violet light to expose the photo-resist. After the exposure the photo-resist is developed to remov
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2013-05-23 12:21:38
工件仔细清洗整个污垢和氧化物。然后是涂光激活，抗腐蚀剂材料ca11edphotoresist和烘烤干燥。在此之后，工件暴露在强烈的紫外线，揭露光阻。曝光后的光阻去除蚀刻所需的所有领域的涂层。经过光阻开发，部分是化学蚀刻来完成操作。
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2013-05-23 12:23:18
工件的是仔细清洁的整个污垢和氧化物。 然后它包裹一轻激活,废侵蚀剂中回收材料耐CA.11edphotoresist和烤干。 这是后工件的暴露,一个强大紫外光,揭露了照片抵制。 曝光后的照片抵制是发达国家,删除的涂料从所有的领域是蚀刻停留。 在这张照片-抵制是发达国家,该组件是化学蚀刻完成操作。
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2013-05-23 12:24:58
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2013-05-23 12:26:38
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2013-05-23 12:28:18
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